Requirement Details
Electron Ion Collider
P-EIS-RCS-INST-TPM.06
Requirement details, history, relationships and interfaces associated with requirement P-EIS-RCS-INST-TPM.06
CURRENT RECORD- ARCHIVE RECORDS
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| Record Date: 01/27/2025 16:43 | |||
| Identifier: | P-EIS-RCS-INST-TPM.06 | WBS: | 6.03.02.05.03 |
| Date Modified: | TBD: | FALSE | |
| Status Date: | Status: | In Process | |
| Description: | Provisions shall be made so that the impedance match sleeve cannot be inadvertently retracted during normal operations. | ||
| Comments: | |||
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| Parents | |
| F-EIS-INST.1 | EIS shall have all the beam instrumentation necessary to deliver the operational parameters set forth in the MPT. [Document#:EIC-SEG-RSI-005] |
| F-EIS- RCS-INST.5 | The instrumentation system shall include a system to measure transverse bunch profiles. |
| F-EIS- RCS-INST.6 | The instrumentation system shall include a system to measure longitudinal bunch profiles. |
| F-EIS- RCS-INST.8 | The longitudinal bunch profile monitor needs turn-by-turn capability based on a single bunch in the fully filled bunch train to allow timing and energy adjustment for injection optimization. |
| F-EIS-RCS-VAC.3 | The impedance of the entire RCS vacuum system shall allow for the bunch intensities, beam currents, and bunch numbers contained in [5.9]. |
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