Requirement Details
Electron Ion Collider
P-EIS-RCS-INST-TPM.04
Requirement details, history, relationships and interfaces associated with requirement P-EIS-RCS-INST-TPM.04
CURRENT RECORD- ARCHIVE RECORDS
- RELATIONSHIPS
- INTERFACES
| Record Date: 01/27/2025 16:43 | |||
| Identifier: | P-EIS-RCS-INST-TPM.04 | WBS: | 6.03.02.05.03 |
| Date Modified: | TBD: | FALSE | |
| Status Date: | Status: | In Process | |
| Description: | The optical resolution for beam profile measurements shall be <50 microns | ||
| Comments: | |||
No archive versions
| Parents | |
| F-EIS- RCS-INST.5 | The instrumentation system shall include a system to measure transverse bunch profiles. |
| F-EIS- RCS-INST.6 | The instrumentation system shall include a system to measure longitudinal bunch profiles. |
| F-EIS- RCS-INST.8 | The longitudinal bunch profile monitor needs turn-by-turn capability based on a single bunch in the fully filled bunch train to allow timing and energy adjustment for injection optimization. |
| F-EIS-INST.1 | EIS shall have all the beam instrumentation necessary to deliver the operational parameters set forth in the MPT. [Document#:EIC-SEG-RSI-005] |
| Children | |
| No children. | |
This function not yet implemented.