Requirement Details
Electron Ion Collider
P-EIS-RCS-INST-TPM.4
Requirement details, history, relationships and interfaces associated with requirement P-EIS-RCS-INST-TPM.4
CURRENT RECORD- ARCHIVE RECORDS
- RELATIONSHIPS
- INTERFACES
| Record Date: 12/06/2024 11:13 | |||
| Identifier: | P-EIS-RCS-INST-TPM.4 | WBS: | 6.03.02.05 |
| Date Modified: | TBD: | FALSE | |
| Status Date: | Status: | In Process | |
| Description: | The optical resolution for beam profile measurements shall be <50 microns | ||
| Comments: | |||
| Record Date: 12/06/2024 11:10 | |||
| Identifier: | P-EIS-RCS-INST-TPM.4 | WBS: | 6.03.02.05.03 |
| Date Modified: | TBD: | FALSE | |
| Status Date: | Status: | In Process | |
| Description: | The optical resolution for beam profile measurements shall be <50 microns | ||
| Comments: | |||
| Parents | |
| F-EIS-RCS-INST-BP.2 | The instrumentation system shall include a system to measure longitudinal bunch profiles. |
| F-EIS-RCS-INST-BP.1 | The instrumentation system shall include a system to measure transverse bunch profiles. |
| F-EIS-RCS-INST-BP.3 | The longitudinal bunch profile monitor needs turn-by-turn capability based on a single bunch in the fully filled bunch train to allow timing and energy adjustment for injection optimization. |
| F-EIS.8 | EIS shall have all the beam instrumentation necessary to deliver the operational parameters set forth in [5.9]. |
| Children | |
| No children. | |
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